O ur aim of research is to realize "Ultra-Large-Scale-Integration (ULSI),
which features flexibility and high intelligence." The area of the
research covers all silicon technologies. Currently, the focused issues
are the development of infrastructure for ultra-short TAT semiconductor
manufacturing, the development of manufacturing equipment using plasma,
research on process technology, development of ultra-high speed device,
electronic circuit for information processing with intelligence, and research
on algorithms reducing computing costs.
The research issues are widely spread so that the research is proceeded
by setting up many "research groups". This laboratory, which
looks around the whole silicon technology, is very unique and, of course,
attractive for its members.
The left-sided numbers are the links to PDF file, which are the introduction
of researches.
These slides are the ones which were exhibited in an exhibition named "Semicon
Japan 2017" in December 2017, at Tokyo Big Sight, Japan, which was
concerned to semiconductor manufacturing.
Please care that the files are protected from PRINTING or MODIFYING for security so that
you can see these files only on computer screen.
1 Total Research Facilities〜 Semiconductor Manufacturing・Analysis・Evaluation〜
2 Evaluation of Various Processes, Parts, Materials
3 Cases of collaborative researches
4 Semiconductor Manufacturing Equipments in FFF
5 High Quality SiN and Highest Selectivity SiN/poly
Dry Etching
6 Low Resistance Source/Drain Contacts with Low
Schottky Barrier for High Performance Transistors
7 New Silicon Technologies Exhibiting Very High
Speed Performance
8 New Statistical Evaluation of MOSFET Electric Characteristics
9 Wet Etching Technology for 3D Integrated Semiconductor
Process
10 Challenges for New Generation Cleaning Technology
11 Microwave-Excited Ultra-Low-Electron-Temperature High-Density
Plasma
12 Radical Reaction Based Plasma Process Equipment
13 Damage-Free Rotation Magnet Sputtering
14 High Frequency Propagation PCBs with the Developed
Dielectric Material
15 Cr2O3 / Al2O3 Passivation Technology
16 Highly-Reliable W-Seal Fitting
17 Perfectly Controlled Gas Distribution System
18 〜Vacuum Parts〜 Advanced Metal Seal High Performance
Welded Bellows
19 Fluctuation Free Facility (1)
20 Fluctuation Free Facility (2)
21 Outline of Cleanrooms in FFF